Spark plasma sintering of tungsten boride sputtering targets: optimization and upscaling
WISNIEWSKA M. 1, MARCZEWSKI M. 1, LAPTEV A. 1, KRAWCZYNSKA A. 2, LEWANDOWSKA M. 2, MOSCICKI T. 3, GARBIEC D. 1
1 ?ukasiewicz Research Network – Pozna? Institute of Technology, 6 Ewarysta Estkowskiego St., 61-755, Poznan, Poland; 2 Faculty of Materials Science and Engineering, Warsaw University of Technology, 141 Woloska St., 02-507 , Warsaw, Poland; 3 Institute of Fundamental Technological Research Polish Academy of Sciences, 5B Pawinskiego St., 02-106, Warsaw, Poland
Initial powders of tungsten, boron and transition metal (TM) such as tantalum, titanium, or zirconium were used to manufacture powder mixtures with the composition corresponding to W1-xTMxB2, where x=0.00, 0.08, 0.16 or 0.24. Powder mixtures were manufactured using high-energy ball milling. Such prepared powders were densified using spark plasma sintering (SPS) technique. Samples in two sizes with diameters of 50 mm (2 inches) and 100 mm (4 inches) were manufactured. What is worth to notice, all samples were sintered using HP D 25 device manufactured by FCT Systeme. It means that the sintering of the samples with a diameter of 100 mm was hindered, due to the fact that our SPS device was designed for manufacturing samples with diameters up to 80 mm. In fact, not only process parameters but also tool design required to be optimized. In our case, the use of additional plates and spacers, both of them made of carbon-reinforced fiber carbon (CFRC), as well as full thermal insulation of the tool setup was made. It allows us to significantly reduce energy consumption during the sintering. The most efficient process parameters were 1650°C and 25 min, for sintering temperature and dwell time, respectively. Heating rates depended on the diameter of the sintered samples and were 200°C/min for smaller diameter and in the range of 100–12.5°C/min for bigger diameter, whereas compaction pressure was 50 MPa and 32 MPa, respectively. The microstructure of the obtained samples was investigated by scanning electron microscopy (SEM) and energy-dispersive X-ray spectroscopy (EDS). Phase identification was conducted based on the X-ray diffraction (XRD) results. Density and electrical conductivity were also measured. Despite differences in density between the center and edges in the sample of W0.76Ta0.24B2 ranging from 8.29 to 8.99 g/cm3, a homogeneous phase composition was observed. This fact allows us to conclude that spark plasma sintering can be used as an effective technique for manufacturing sputtering targets for high-power impulse magnetron sputtering (HiPIMS). A combination of SPS and HiPIMS technology seems to be a promising way to manufacture hard and elastic coatings in particular for tools used in metal forming processes.
Keywords: SPS, Sputtering Targets, WB, hard materials